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Preparation And Research Of Deposition-type Multicolor Electrochromic Device

Posted on:2021-01-04Degree:MasterType:Thesis
Country:ChinaCandidate:T GaoFull Text:PDF
GTID:2381330623468501Subject:Optical engineering
Abstract/Summary:
Compared with ordinary polarized liquid crystal materials,electrochromic materials have the advantages of energy saving,active controllability,continuous adjustment and privacy,and are widely used in the fields of building energy saving,transportation,military aerospace and smart home.With the development of science and technology,electrochromic technology has appeared more promising new application directions,such as self-powered electrochromic,all-solid electrochromic and so on.Among them,the multi-state electrochromic device that can realize from the transparent state to the specular reflection state to the multi-color state has become a potential candidate for new display devices.In this paper,based on the local surface plasmon resonance(LSPR)effect,the surface microstructure array is constructed as an anchor nucleation point,and the step voltage method is used to control the reversible electrodeposition of Ag on the microstructure array to adjust the size of the deposited nanoparticles.Therefore,the LSPR absorption band of the electrochromic device is changed,so that the device can realize the controllable change of different colors.The main content of the paper is as follows:First of all,the preparation method of rough surface array structure was studied.Wet chemical method and vacuum coating method were used to prepare SiO2 and MoO3 nanoparticle structure arrays.The wet chemical method has a simple process and low cost.The structure of the SiO2 array prepared by the method has good size uniformity,regular shape,dense arrangement,no accumulation and cracking phenomenon,and a tri-state electrochromic device with excellent performance can be prepared.The vacuum coating method has mature technology and high repetition rate.The MoO3 thin film prepared by this method has good compactness,uniform film formation and no stacking phenomenon;the nano-particle structure has high arrangement density,uniform size and distribution,and stable structure.Secondly,based on the study of vacuum coating method,microarray structures are prepared using WO3 materials with higher acid resistance and better hydro-oxygen stability.This paper introduces the method of inducing the preparation of WO3 film array structure by ag of magnetically controlled sputtering method,and compares and optimizes the experimental results from the sputtering time,sputtering temperature and sputtering power respectively,seeks the optimal experimental parameters,and on this basis,prepares the WO3 film structure structure with high density,good uniformity,shape rules,small nanostructure size(about 120 nm diameter),roughness conforms to the requirements(RMS= 113.3 nm).Finally,a multicolor electrochromic device based on WO3 array structure was prepared.By optimizing the electrolyte composition and ratio,and improving the existing packaging technology,the device can achieve a good performance of the transparent stateblack state-silver mirror state electrochromic effect at a constant voltage,and the initial transmittance of the transparent state can reach 67.9%,The black state transmittance is less than 5%,the lowest is less than 2%,the silver mirror state transmittance is less than 10%,and has a reflectance of more than 90%;under step voltage,the device is due to the dynamics of the transmittance spectrum Move,showing dynamic and controllable multicolor display changes.In addition,the coloring and bleaching processes of the device are completed in about 18 s and 3 s,respectively.The transmittance contrast(ΔT)between the colored and faded state is about 40%,and the multi-color electrochromic device can be more than 500 times The coloring and fading cycle maintains stable performance.
Keywords/Search Tags:Electrochromic, LSPR, Array structure, Magnetron sputtering, heterojunctions photodetector
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