Study On Microstructure And Properties In Preparing Of High Purity Aluminum Target

With the strong support for the new material industry during the national "the 13 th Five-Year Plan",high-purity aluminum target is highly needed,for its excellent performance and as the basis of electronic new material products.In order to fit the high standards of high purity aluminum materials in the fields of electronics industry and aerospace,the main performance indexes such as grain size,uniformity of organization and preferred orientation need to reach certain requirements.Based on the above purpose,this paper takes pure high purity aluminum 5N5 as experimental object,uses the rolling deformation,equal channel angular pressing(ECAP)technology and heat treatment to improve the performance and optimizes the microstructure of high purity aluminum.First of all,the cold rolling process of high purity aluminum was carried out from 40% to 90%,and the samples were all annealed.Then the strong plastic deformation of the high purity aluminum was obtained by the ECAP Technology.The effects of different deformation techniques and heat treatment on the microstructure of high purity aluminum were studied by analyzing the microstructure and transmission electron microscopy(TEM)of different rolling,ECAP deformation and annealing samples.The microstructures and mechanical properties of high purity aluminum were investigated by scanning electron microscopy(SEM).The effects of different deformation techniques and heat treatment on the mechanical properties of high purity aluminum were studied by scanning electron microscopy(SEM).Finally,the high-purity aluminum after rolling deformation and annealing was prepared as a target and was sputtered through magnetron The effect of different rolling deformation and annealing on the sputtering performance of the sample was studied by analyzing the sputtering rate of the target and the resistivity of the film.The results show that:1.For different rolling deformation of high pure aluminum materials after annealing,when the rolling deformation is 40%,there is no recrystallization phenomenon.The phenomenon of recrystallization occurs when the rolling deformation increases,and the recrystallization temperature decreases with the increase of deformation.With the rolling deformation changing from 50% to 90%,the recrystallization temperature is reduced from 350? to 250?.The grain size alsodecreases with the increase of the deformation.From 50% to 90%,the grain size at the time of recrystallization is reduced from about 200 ?m to less than 100 ?m,which achieves the purpose of uniform refinement of high purity aluminum.2.The mechanical properties of the material are improved after the rolling of the high purity aluminum material with different deformation.With the increase of the deformation,the performance is more obvious.When the deformation of rolling changes from 40% to 90%,the hardness is increased from 37% to 69%,and the tensile strength is increased from 3 times to more than 6 times which is compared with that of primary samples.The mechanical properties are improved obviously.After annealing and recrystallization,the hardness and tensile strength decreased,but still higher than the original state.3.By analyzing the microstructures of the samples after ECAP deformation,the grain becomes more uniform and refined with the increase of the extrusion times,and the sub-crystal structure appears in the 6 deformation.After 10 passes,a significantly uniform fine grain having a grain size of 1?m is obtained.After ECAP deformation,the trend of hardness and tensile strength of high purity aluminum is almost same.With the increase of extrusion passes,they are significantly improved,At 4 times,they reach 38 HV and 117 MPa and increase 59% and 430% than those of the original state respectively.It is shown that the grain refinement effect of high purity aluminum after ECAP deformation is very obvious and the mechanical properties are improved remarkably.4.The sputtering rate and the resistivity of the target are analyzed by magnetron sputtering of the pure aluminum targets which are in the original state or in different rolling of annealing states.With the increase of the amount of rolling deformation,the sputtering rate of the target gradually increases,the resistivity of the sputtered film decreases gradually,and the sputtering performance of the target gradually increases.