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Study On The Structure And Properties Of Silicon-based Hastelloy Films Prepared By Magnetron Sputtering

Posted on:2019-08-12Degree:MasterType:Thesis
Country:ChinaCandidate:T T PangFull Text:PDF
GTID:2371330548958089Subject:Fluid Machinery and Engineering
Abstract/Summary:PDF Full Text Request
As a corrosion resistant nickel base alloy,Hastelloy C-276 has been widely used in the field of industry.Preparation of Hastelloy C-276 into thin films can reduce the cost of use and use material properties effectively.The high quality Hastelloy C-276 thin films are prepared by DC magnetron sputtering,the preparation process and structure,component,properties of thin films are studied.The theoretical formula is used to calculate the thermal stress in the thin film,and the thermal stress in the film is simulated by the ANSYS finite element analysis software,the results show that the stress and strain of the thin films near the edge are larger,films are easy to fall off,the level of thermal stress in the films is much greater than that of the substrates.The theoretical calculation results are compared with the simulated results,the general rule of thermal stress variation with matrix thickness,film thickness and deposition temperature has been obtained.At first,the chemical composition of the thin films is analyzed by XPS,the experimental results show that the composition of the film is basically the same as the composition of the target,and the metallic elements in the films are basically in the metal state except for Ni.Then the effects of different coating parameters on the deposition rate,microstructure and hardness of the film were studied,it is proved by experiments that the influence of sputtering power on the growth process of thin films under different working pressure is very different,it should be distinguished.At the same time,the influence of working pressure and target base distance on the structure and properties of the film is also studied,the best parameters in the experiment range are obtained.Finally,the argon protection annealing treatment of C-276 film at different temperatures was studied,the annealing temperature ranges from 450? to 750?,and the hardness of the films decreases as a whole.The structure,hardness and friction properties of the films are studied,and the thin films with grain refinement and low friction coefficient are obtained,and also the thin films have similar phase structure with the Hastelloy C-276 block material are obtained.
Keywords/Search Tags:DC magnetron sputtering, Hastelloy C-276 thin films, preparation process, annealing treatment, microstructure and properties
PDF Full Text Request
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