Physical Properties Of MgO Film Made By Magnetron Sputtering

MgO crystals rock salt structure is a kind of face-centered cubic crystal, has many excellent properties. It’s lattice constant is similar with some of the pervskite structure, MgO thin films used in high-temperature superconducting oxides, ferroelectric materials and high magnetoresistive material of the buffer layer because of It’s good thermal stability and insulation. Meanwhile, MgO thin films is often applied to microelectronic devices and plasma display areas. Therefore,preparation of high quality MgO film has important scientific significance and application prospects.In this Paper, MgO thin films were deposited by magnetron sputtering in Ar/O2 mixture gases.The microsurtcuter 、moprhology 、growthorientation of MgO films are affected regularly through controlling some parameters including substrate temperature 、 substrate material and deposition time. X-ray diffraetion(XRD) and scan electron microscope(SEM)were employed to characterize their sturcture and morphology. Finally we have deposited excellent MgO thin film samples under the process conditions of the substrate temperature of 400℃, the substrate material of quartz plate and 3h deposition time.Then the deposited high quality MgO thin film samples were annealed respectively 30 min at500℃、700℃ and 900℃.The results showed that annealing can improve the crystalline quality of the film. As the annealing temperature increases, the grain size increases, the crystallization properties become better, and the surface becomes more smooth. The optical properties were also studied by using UV visible spectrophotometer. The results showed that with the film annealing temperature increasing, the visible light transmittance decreased gradually, together with the optical band gap value decreases.