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The Optical Properties Of Two-dimensional Materials Of Tungsten Sulfide And Molybdenum Sulfide Were Prepared By CVD Method And The Characteristics Of Field Effect Transistor Devices

Posted on:2018-04-21Degree:MasterType:Thesis
Country:ChinaCandidate:L ChenFull Text:PDF
GTID:2358330536956390Subject:Materials engineering
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Since the discovery of graphene in 2004,atomically thin two dimensional materials have attracted broad interest,due to their unique electrical and optical properties.Transition metal dichalcogenides?TMDs?have shown great promise for microelectronics and photoelectronis.Atomically WS2 have been investigated,which exhibited many appealing properties for a wide range of applications,such as transistors,photodetectors,solar cells and so on.In my study,we systematically investigated the preparation and application of WS2 and Mo?1-x?WxS2 alloy.The results obtained are as follow.?1?The Monolayer of WS2 has been grown by Chemical Vapor Depositin?CVD?at optimized conditions.The obtained WS2 monolayer of?20 ?m in size and thickness is around?0.95 nm.There is a significant difference has been found in between monolayer and multilayer WS2 by Raman spectroscopy study.In both mono and multilayers show two prominent peak,which are associated with well known E2g1 and A1g modes of WS2.Compared to E2g1 mode and A1g mode for monolayer WS2,the E2g1 mode is practically stronger than A1g mode,with the WS2 layer thickness.The E2g1 mode shows a red-shift and the A1g mode shows a blue-shift.From the photoluminescence?PL?study,it is also found that the peak intensity of WS2 monolayer was noticeably stronger than that of multilayer.We also study on the thermal conductivities of monolayer WS2,which was determined by temperature dependences of E2g1 and A1g Raman modes.The frequency shift of the A1g mode with temperature is larger than that of the mode E2g1 for WS2 monolayer,which is attributed to stronger electron-phonon coupling in the A1g1 mode.By analyzing PL data on the monolayer WS2 with variation in temperature,it has been found that the bandgap gap changes with the lattice expansion effect due to the temperature variation.?2?The high-quality ternary alloy of monolayer Mo?1-X?WxS2 with Mo dopping in WS2 was synthesized via CVD.It is proved that Raman spectroscopy can accurtately distinguish ternary alloys and heterojunctions.The compostion can be estimated inversely by PL spectra.The PL spectrum indicated that the band gap of alloy of Mo?1-x?WxS2 could be tuned precisely between 1.82 eV?MoS2?and 1.95 eV?WS2?by changing the ratio of Mo/W compositions.We calculated that monolayer as-grown Mo?1-x?WxS2 component x was 0.68.Temperature-dependent Raman results of the as-grown Mo?1-X?WxS2 flake explore the ternary Mo?1-x?WxS2 alloy,which is result from low free energy and internal energy of ternary Mo?1-x?WxS2 alloy.?3?For the first time,we have fabricated back-gated Mo?1-x?WxS2 field effect transistors with high on/off ratio??105?by electron beam lithography followed by lift-off process.Over the different electrical measurement temperature?20 K-300 K?,the metal-insulator transition?MIT?is not very clerly observed,it may be due to the low electron charge concentration?less than 1×1013 cm-2?and limited gate sweep voltage 70 V?devices breakdown with further increasing measurement voltage?.Furthermore,we have measured the transport properties of monolayer Mo?1-x?WxS2 transistors from 300 K to 20 K and simulated the data by activation transport model.At high temperatures?>80 K?,the carrier transport is thermally activated whereas atlow temperature range?<80 K?,the carrier hopping transport through localized states.To gain further insight into the charge scattering mechanism,a monotonous increase of the mobility as the temperature is decreased and become saturated at low temperature?below?80 K?.Further it reaches to?30 cm2V-1s-1 at 300 K.Below 80 K,the field effect mobility saturates to an intrinsic value limited by Coulomb scattering.
Keywords/Search Tags:Chemical Vapor Deposition, monolayer WS2, monolayer Mo1-xWxS2, optical properties, field effect transistor
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