Mechnical Analysis Of The Template During Step-and-flash Nanoimprint Lithography

With the rapid development and upgrading of digital products and electronic products, People's needs for the stronger and faster and cheaper products are also increasing. Lithography technology is the basis of the construction of semiconductor and circuit in silicon chip. As a very important part of the IC manufacturing, the nanoimprint lithography has been included in the 2013 international semiconductor technology roadmap. Step-and-Flash nanoimprint lithography has been considered to be the most promising method. In this paper the model is calculated and analyzed by the control equation and CFD software simulation. The contents of the research are as follows:Firstly, the model of the rigid template is analyzed. The parameters are set to establish the model, which are closely monitored in order to obtain the data of the flow condition of the photoresist. In consideration of the viscosity and surface tension of the nanoimprint lithography, the influence of the contact angle and the pressure change of the adhesive are analyzed. The incompressible viscous fluid continuity equation is used to analyze the embossing plastic model, and the model is deduced under the control equation. Then the related models are established and calculated with the help of CFD software FLOW-3D. The results of the model are compared with those of the deducted theories. Also, comparative analysis would be conducted on various parameters of the model including speed and viscosity, in order to find out the relations between these parameters and the cost and efficiency of imprinting.And then, the model of the soft template is analyzed. The soft model has many advantages. However, due to its deformation in the process of imprinting, the control equation needs to be rewrite. In the soft model, different parameters of the modulus of elasticity, thickness and viscosity will lead to different results. Different parameters have different effects on the results, and they will guide the practical application.Finally, the method of the traditional Step-and-Flash nanoimprint lithography is improved. Rearranging the photoresist drop, making use of that small drop will reduce the pressure and reduce the duration of imprint lithography. In this paper the cell approach is adopted to reanalyze the whole model. In this model, imprint lithography is divided into two stages, the independent stage and the coalescence stage. The new model is calculated and the new pressure stress and the imprint time are obtained to be compared with the previous model.In this paper, a detailed analysis and calculation of the step-and-flash nanoimprint lithography is carried out. Respectively for the rigid template and soft template model, comparative analysis of the various parameters is conducted. And the model is improved by rearranging and distributing. The effects of different parameters on the actual process of lithography are obtained, and the best set of the parameters that minimizes the cost and maximizes the efficiency could be drawn upon the results of the comparative analysis. This paper is of practical significance to the application of the Step-and-Flash nanoimprint lithography, which could serve as a reference for the practical application of nanoimprint lithography machine.