Research On Design And Control Method For High Power Pulsed Magneto Sputtering Power Supply

High-power pulsed magnetron sputtering(HPPMS)technology is a magnetron sputtering coating technology with extremely high pulse peak power,high atomic atomization of the target,and strong bonding force of the film base.Because its peak power can be increased to megawatts,the pulse peak current can be as high as several thousand amps,which is of great significance for the preparation of films with excellent abrasion resistance.The high-power pulsed magnetron sputtering power supply is a key part of the HPPMS technology,and its excellent performance seriously affects the quality of the coated layer.In order to improve the wear resistance of the coated layer using HPPMS technology,a high-power pulsed magnetron sputtering power supply with peak pulse power up to8 MW was designed in this paper.The power supply uses DC charging power to provide energy,and the high-voltage pulse capacitor stores energy and instantaneously releases energy to the load through the IGBT matrix switch,thereby enabling the HPPMS power supply to reach a megawatt-level pulsed peak power output.In this paper,we first describes the working principle of HPPMS power supply,and focuses on the work principle of the full-bridge inverter phase-shift circuit and capacitor charging and discharging.Secondly,we elaborates design process of the DC charging power supply,the two-stage modified pulse generation circuit and the DC charging power supply.The compound controller of variable-speed integral PI and the improved repetitive control are designed;the electromagnetic interference suppression circuit is designed to solve the electromagnetic interference problem of the IGBT driver;a dual-CPU control system of the DSP and the single-chip microcomputer is designed,and digital control of the power supply is realized.Improve the stability of power supply operation.Finally,the simulation analysis of each module was carried out using MATLAB simulation software.based on this,an experimental prototype was set up to perform experimental analysis and research under simulated load.Simulation and experiment analysis shows:the new high power pulsed magnetron sputtering power supply is designed in this paper has advantages of compact structure,simple control,stable operation and high output pulse power.The development of the new HPPMS power supply has made a solid step in the industrial application of high power pulsed magnetron sputtering technology in the field of vacuum superhard tool coating.