Study On The Design Of Ion Source Arc And Its Parameter Measurement Analysis

Multi-arc ion plating machine is an efficient vacuum coating equipment,the core components of the device cathode arc source is mainly used for plasma emission,the plasma emission quality is the key factors affecting the entire coating process and film quality.Usually the arc source will produce some macroparticle impurities,and the macroparticle of the magnetic filter is to remove it the most common way,the actual industry is also the most widely used.The use of curved magnetic filter greatly reduces the ion concentration,for the coating of the coating whether the film quality or film formation rate is not a good choice,excellent arc source design can do most of the metal stable,efficient,clean arc discharge,at the source to curb the production of large particles.Therefore,it is of great theoretical and practical value to study the magnetic field,structural analysis and test research of ion source.The subject is based on the multi-arc ion plating project of the Institute of Mechanical Linear Accelerator of Nanjing University.According to the mechanical properties of plasma,combined with acute angle method and magnetic field focusing principle,the movement of plasma under magnetic field is studied,and the magnetic field model of ion source is established.Based on the FEMM(2D electromagnetic field analysis software),analysis and comparison in the target rear plus axisymmetric magnetic field and combined magnetic field Selected excellent magnetic field,which provides important theoretical basis for the structural design of arc source.Based on the ANSYS software,the finite element thermal simulation of the arc source target is carried out.The difference between the direct cooling of the target and the indirect cooling through the copper target is compared and the cooling form is determined,the 3D structure of the arc source is modeled by SolidWorks.In the case of ensuring the vacuum seal and the magnetic field structure of the arc source,the assembly method is designed reasonably to achieve the optimal structure of the arc source.Finally,based on the performance requirements of PCB micro-drilling,the theoretical and practical basis for the design and application of plasma arc source are provided by testing and comparing the performance of the film of the ion arc source.