The Research Of UV-LED Lithography System And Process

Lithography has been the key of semiconductor manufacturing. The development of lithography equipment is also the focus of research in the world, the traditional near UV wavelength lithography equipment maintain high cost, complex, and the operation is not convenient. In recent years, due to the rapid development of semiconductor lighting materials and technology, it is essential to develop a compact, easy-to-operate and low-cost UV-LED lithography.In this paper, the development process of lithography equipment, the procedure of lithography, and the comparison of several kinds of light source used in semiconductor lithography as a light source are discussed.We present the shortcomings and limitations of traditional mercury lithography equipment. Here, a new type of UV-LED exposure light source stability and control is studied, and the process method of obtaining fine pattern of UV-LED lithography equipment is studied and discussed. Main contents are:1. The principle of LED luminescence is studied, the luminescence and electrical properties of UV-LED are analyzed, and the optimal control method of UV-LED stability is obtained by experiments. Design of UV-LED constant current drive, and the stability and control of the wavelength and intensity of the light source are discussed. According to the experimental results, the control method of the stability of the work is summarized.2. The optical path and the micro alignment optical path are studied, and the simulation scheme is proposed. Through the experiment can get the exposure light uniformity above 95% collimated light microscopy; resolution of up to 1μm on the road.3. After the integration of the whole machine was studied, through the UV-LED lithography experiment, the new equipment of the whole set of lithography process for the experimental study, to explore the fine lines of the lithography process. On the basis of the new lithography to get 1 μm graphics on the basis of a set of moments, get the second time exposure of the graphics.The feasibility and effectiveness of the UV-LED as a light source is demonstrated, which shows the great potential of UV-LED as a lithography light source in the visible and near UV wavelength range.