| Laser interference lithography technology is a kind of maskless lithography technology, this technology to supplement the deficiency of traditional lithography technology, and it has many advantages such as: high resolution, long focal depth, mass production.This thesis on laser interference lithography are studied systematically, laser interferometric lithography purpose and significance of the research are reviewed, and the current in solar cells, biosensors, mask and other applications. This paper studies the theoretical foundation to the experimental analysis, first introduced the basic theory of maskless interference photolithography mode laser, experiments were carried out on the basis of theory. Because the lithography technology based on the beam number is divided into two beam interference lithography, three beam interference lithography. This paper through the required experimental building optical path, the realization of the double beam interference, three beam interference experiment, using optical sensor to detect the transmission signal, and then analyzed the diffraction efficiency and the internal mechanism obtained from kinetic characteristic curve. Because the thin film material with the paper in the experiment of spirooxazine /PMMA polymer, it is a kind of photochromic material and has a fluorescent properties, these properties can be used in the confocal microscope conveniently and clearly see the microstructure pattern. According to the lithography exposure times can be divided into single exposure, double exposure and multiple exposure, we achieved the double beam and double exposure, double beam multiple exposure and beam single exposure, respectively, obtained the micro graphics.At present, lithography is further improved, can be etched microscopic images of fine, interference lithography using laser advantage, etching to produce the required pattern, has the very good application prospect of laser interference lithography. |
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