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Design And Research Of A Precision Positioning Stage For Nanoimprint Lithography

Posted on:2015-05-17Degree:MasterType:Thesis
Country:ChinaCandidate:Q LiFull Text:PDF
GTID:2298330467966584Subject:Mechanical engineering
Abstract/Summary:PDF Full Text Request
Nano-imprint lithography is one of the most promising technologies applied insemiconductor chip manufacturing methods.the advantages are low cost and highefficiency.The research on nano-imprintlithography is booming,therefore,the research on high-precision orientation stage has great theoretical significance and applicationvalue. High-precision orientation stage is the key component in the nano-imprintlithography equipment. The positional accuracy of worktable influences manyphotolithography parameters of lithography equipment such as the accuracy of figuredisplacement, overlay and alignment and the resolution ratio. The quality ofhigh-precision orientation stage decides the quality and accuracy of imprint.Aiming at develop the high-precision orientation stage of nano-imprintlithography.This paper reaches a new three degree-of-freedom spatial flexible parallelmanipulator. Many key technologies such as the innovation of structure design,kinematics analysis, stiffness analysis, statics and dynamics analysis and error modelingare done in the paper. Details are as follows:1. Based on the improved3-PPRR parallel manipulator, the revolute joints in thismechanism are replaced by one degree-of freedom flexure hinges. A new threedegree-of-freedom spatial flexible parallel manipulator is worked out.3D model of thismechanism is established. This positioning table uses multiple piezoelectric ceramicactuator,so, the justification of terminal position can be realized.2. Based on the motion constraint equation, analytical expression of inversepositional problem can be obtained. Numerical solution of forward displacementanalysis can be obtained through newton iteration method, then, its correctness isverified by an example. The mathematical models of velocity and acceleration betweeninput parameters and output parameters are established, so, the direct and inversesolutions of velocity and acceleration are obtained. The planning trajectory isverified through simulation in RecurDyn.3. Based on the research for typical hinges stiffness, static stiffness theoreticalmodel is researched. The relation formula between static stiffness matrix and flexibilitymatrix of theis compliant mechanism is obtained. Finite element model is establishedthrough3D model. The finite element analysis for this mechanism is done, therefore, it is verified that the motion characteristics of this mechanism satisfied the requirement ofthis project.4. Finally, taking into consideration many error sources, then, two errorcompensation methods are presented.
Keywords/Search Tags:nano-imprint, compliant mechanism, kinematical modeling, static stiffness, error analysis
PDF Full Text Request
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