The Design And Implementation Of Low Pressure Chemical Vapor Depositon Equipment Control System

The low pressure chemical vapor deposition is the core technology of the thin film solar industry, is the main method of production of TCO glass. TCO glass refers to the use of physical or chemical methods in surface deposits a layer of transparent conductive oxide films uniformity of flat glass, mainly used for thin film solar cells before the base plate(electrode), its performance for thin-film solar cells have considerable influence on the final conversion. The production process of TCO glass is cumbersome, it’s need several devices to work together, after completion of the production it needs to use nitrogen gas cleaning cavity and for a long time, these things reduce the production efficiency of the equipment. In a multi equipment production environment, the equipment which takes long time process at full load for a long time, and the process time shorter equipment idle for a long time is inevitable, if not reasonable scheduling then the equipment resources waste is inevitable. Equipment for diverse and scattered comparison is unfavorable to collect the production data and equipment management. Equipment control is in closed opaque cavity in the body, not intuitive to see the change of the state in the body, also brought a lot of trouble to operators. These problems become the bottleneck of the LPCVD equipment development.This thesis’ s work is based on a well-known domestic photovoltaic equipment manufacturer(hereinafter referred to as "E") of the actual project as the background, on the basis of analyzing the LPCVD equipment of the production process, designs and realizes a new LPCVD equipment control system. The system includes a graphical interface control, user account management, error correction formula, process management, the safe operation of the equipment protection mechanism, equipment real-time state data management and non real-time equipment information management function module, test and application show that this system has realized the equipment of precise control and scheduling optimization, improve the production efficiency.Compared with the other similar systems, the research work in the thesis has following features: 1. LPCVD equipment control system choose Prodave open source library and TCP/IP communication protocol with Siemens PLC to communicate, to constantly traverse each module of PLC to get the latest data, can reach 10 milliseconds can traverse the 200 I/O points, the maximum guarantee the real-time performance of the system. 2. LPCVD equipment control system use C/S architecture and WCF technology to realize multiple clients to visit LPCVD equipment at the same time, so that when an operator to operate on a computer, another computer you can also view the process data with the machine running state, to avoid the line operation. 3. LPCVD equipment control system use WPF technology to realize the graphical interface of the client, by obtaining from the PLC I/O points to draw the real device profile, for operator intuitive display the current operation state in the cavity. At the same time provide the corresponding page operation, management and statistics page, page to the machine operation, the information management operation the machine and check the production data, greatly enhance the user experience.