Preparation And Properities Of Cu-Zr Alloy Thin Film Produced By Magnetron Sputtering

Recent years, amorphous alloy film with an atomic configuration of long-range disorder and short disorder has attracted increasing interests from materials science community due to its excellent mechanical properties, biological compatibility and corrosion resistance. Magnetron sputtering is a kind of advanced techniques used to fabricate the coatings. However, it is still a challenge topic to deposit glassy alloy thin film by magnetron sputtering technique.Here, Cu50Zr50 binary alloy with excellent glass forming ability is selected as model material. Using magnetron sputtering, Cu50Zr50 metallic glasses thin film has been deposited on silicon substrate,which is benificial to characterize the structure of the metallic glasses thin film. Subsequently, a series of thin films prepared by magnetron sputtering with different parameters has been deposited on the Ti-6Al-4V alloy substrate. The corrosive properties,the wear resistance,and the antibacterial properties of as-deposited films has been detected by using electrochemical workstation, friction and wear test, contact angle measurement, and antibacterial test equipment.Higher power and longer duration of magnetron sputtering can lead to thicker film and higher substrate temperature.Higher substrate temperature will result stronger crystallization tendency of the as deposited film.Cu-Zr alloy thin films exist in the form of nanoglass consisting of numerous atomic clusters. Higher power and longer duration of magnetron sputtering causes larger the size of the atomic clusters. The process of film deposition can be divided into two stages:(i)the increasing roughness of the as-deposited film at the first stage, and(ii)the decreasing roughness of the as-deposited film at the second stage.There exists a diffusion layer between the film and the substrate, and higher substrate temperature leads to thicker diffusion layer.The electrochemical corrosion experiments has been performed on the as-doposited Cu-Zr films prepared by different sputtering parameters and the electrochemical parameters such as the Tafel plan curve, the self etching potential and the self etching current were obtained.The friction and wear experiments were carried out on the Cu-Zr alloy films prepared by different sputtering parameters, and the friction coefficient curves of films prepared by different sputtering parameters were obtained. The results show that the longer the magnetron sputtering time and the higher the power, the better the wear resistance of the film is.The surface energy tests of Cu-Zr thin films prepared by different sputtering parameters were carried out, and the contact angle and surface energy of Cu-Zr thin films prepared by different sputtering parameters were obtained. The surface energy of the film is increasing when the power of magnetron sputtering is increasing. The surface energy of the deposited film is increasing at the first step, the surface energy the deposited film is decreasing at the second step.The antibacterial property tests were carried on the Cu-Zr alloy films prepared by different sputtering parameters, the corresponding bacterial colonies and antibacterial rates of different samples were obtained.The results show that the Cu-Zr alloy film has a strong antibacterial effect which is better than that of the substrate Ti-6Al-4V alloy. The better surface hydrophobicity of the Cu-Zr alloy film, and the better antibacterial effect is.