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Chemical Prepared Black Silicon Film And Performance Study

Posted on:2014-05-02Degree:MasterType:Thesis
Country:ChinaCandidate:X WuFull Text:PDF
GTID:2268330425993477Subject:Microelectronics and Solid State Electronics
Abstract/Summary:PDF Full Text Request
Black silicon is a kind of new silicon material which has a very high light absorption rate in the visible and near-infrared region. It has a great prospect in the field of solar cells and photodetectors. Thus, the production and properties of black silicon has also become a hot issue.The main content of this article is combing two wet etching to produce the black silicon which has a micro-structure surface. This method is simple and easy to operate. Firstly, the main concern is the impact of corrosion time, corrosion temperature, etchant concentration to the surface of black silicon. The best black silicon can be made through1%KOH,15minutes etching and20degree of corrosion temperature. After that, with the precious metals nanoparticles as catalyst, after using acid etching to modify the surface of black silicon, porous silicon will form, and the light absorption rate of visible light can reach95%.
Keywords/Search Tags:Black silicon, Wet etching, Light absorptivity, Surface morphology
PDF Full Text Request
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