Research And Design On Safety Assistant System Of Double Wafer Stage

Lithography is one of the most important devices in IC(Integrated Circuit)production. It embeds the electronic components into semiconductor using a kindof optics corrosion technique. According to the development of Computer andInformation technical, IC production needs lower power, more integration andmore precision process. As all know, the measure becomes from Micron to Nanonow. All of these give a big challenge to the development of Lithography. Forbreaking monopoly of the developed countries, China begins to vigorouslystrengthen the development of Lithography.The paper researches in precision double wafer stage of lithography,including high-speed and high-precision movement of the security issues. Afteranalyzing the exchange of Wafer Stage, there are three fault conditions thatcollision、step error and alignment required about Wafer Stage. On this basis,the main solutions are setting up buffer and logical evaluation of the system.Buffer is designed by setting up end of stoke, and logical evaluation is designedby devising Safety Board. For the chip selection and circuit design of the SafetyBoard, the FPGA Cyclone II as logical core and the VME bus interface，CPLDis designed to be communication between FPGA and VME. This paper designs acomplete logical circuit and produces a safety board, which provides a hardwarefoundation for the control theory and software implementation.Cable Shuttle Stage with flexible appendages is a precision servo systemabout rigid-flexible coupling. In this paper, Cable Shuttle Stage is researchedabout high-speed motion control. Research topics contain dynamic model ofCable Shuttle Stage Control System and characteristics of its free vibration anddesign of the Cable Shuttle Stage control system. In the design of Cable ShuttleStage Control System strategy is PID Control and Sliding Mode Control, andwith the help of the simulation, the conclusion is that the servo system has veryexcellent characters.