Research On Plasma Repair Theory And Experiments Of Damaged Subsurface Of Optical Element

In order to reduce the subsurface damage of optical element and improve its performance, this article propose a method by combining polishment to reduce the subsurface damage.In analysis of the model of subsurface damage and its injury manifestations, based on subsurface damage detection techniques,we identifies using white light interferometry as a test of the experimental method.In this paper, vacuum plasma polishing mechanism were studied. Including vacuum plasma generation, plasma physics and plasma chemistry removal characteristics are analyzed in detail. This analysis described above layed the theoretical foundation for subsequent simulation and experiment. We then used the SRIM software to do the simulation study of low energy ion beam etching. Then obtain the data between sputtering yield curve and subsurface damage curve under different process parameters, which shows that when processing parameters selected reasonably, we could effectively improve the sputtering yield material and reasonablely reduce the thickness of subsurface damage layer.During the experimental researching, classical polishing and plasma polishing method for fused silica polishing are studied. By contrasting with the classical polishing and plasma polishing method we can prove that plasma polishing can effectively reduce the subsurface damage thickness of the optical elements. To this end, we adopted a combined processing technology to gradually reduce the mechanical polished fused silica subsurface damage levels and enhance laser induced damage of optical elements while achieving the desired surface accuracy.This combination of polished ideas can be applied to promote the comprehensive application of various polishing methods.