Ultrasonic Assisted Hf Acid Treatment Technology In The Manufacture Of Optical Surface Zero Defect Effect Research

The surface and sub-surface defects of optical materials seriously reduce the abilit y of the element laser induced damage, making it an important bottleneck restricting h igh-power laser systems. Pursuit of manufacturing zero defect process, extend the life of optical components to improve the ability of laser induced damage is needed to sol ve the problem. In this paper, the method of ultrasound-assisted HF acid etching proce ssing, from the surface quality of the components, sub-surface defects inhibition as we11as the damage threshold, and compared with the traditional static etching, analysis o f the kinds of technology the role played in the optical manufacturing.The paper describes the mechanism of sub-surface defects induced damage, the m ain reason for the lower damage threshold of impurity absorption and sub-surface defe cts. Two different types of chemical etching model simulation results illustrate the rela tionship of changes in the size of the sub-surface defects with etching time, and in th eory the best to play the role of ultrasound-assisted HF acid etching. Was found in th e research on the quality of the surface of the optical element, the chemical etching makes the surface shape of the optical element and the surface roughness deteriorates, while the ultrasonic vibrations can play a catalytic role, and the optical element of cl eanliness has been greatly improved. Ultrasound-assisted HF etching allows acid to ent er the static etching is difficult to enter the narrow micro-cracks, so that the etching s olution fully fused silica material, the passivation process becomes more rapid and the passivation effect In order to thoroughly. Element after the ultrasound assisted etching, since the sub-surface defects by the passivation effect, weakening the modulation of t he incident field, generally been improved by the anti-damage threshold, and is superi or to the results of the static etch. In addition, the ultrasound added to the reaction pr oduct is removed from the surface, the reaction product is suppressed redeposition phe nomenon.