Preparation And Optical Properties Of Zno Composite Film Studies

Multilayer structure can be simply prepared, and metal layer could be consideredas dopant to ZnO thin films. And Cu have better electrical conductivity and lower price.Based on these advantages, Cu interlayer ZnO multilayer transparent conductive filmshave more practical significance, although d oping method is applied more in preparingZnO transparent conductive films. ZnO, ZnO/Cu/ZnO and ZnO/Cu films are studiedmainly in this paper. The main contents are as follows.ZnO films were prepared on glass substrates by reactive RF magnetron sputtering.The influence of growth temperature, sputtering power, atmospheric pressure andannealing temperature on the crystal structure, optical and electrical properties werediscussed. ZnO films show some performance, such as preferred c-axis orientation,resistivity in the102cmorder, visible transmittance above80%. The crystalline offilms could be improved by increasing growth temperature, sputtering power,atmospheric pressure or annealing temperature. The resistivity is bigger in highergrowth temperature.ZnO/Cu/ZnO, ZnO/Cu films were prepared by reactive magnetron sputtering. Theinfluences of growth temperature, ZnO or Cu layer thickness on optical and electricalproperties were discussed. Films show lower resistivity in10-4cmorder than ZnOfilms and high visible transmittance over80%.The Cu interlayer plays a major role inresistivity and transmittance of ZnO multilayer films. The resistivity and transmittancewere reduced significantly by increasing Cu layer thickness. By comparing the ZnO,ZnO/Cu/ZnO and ZnO/Cu films made in same conditions, it shows that the resistivityof ZnO/Cu film is lower, and the transmittance of ZnO/Cu/ZnO film is higher.