The Simulation Study Of Three Dimensional Thin Film Growth On Fcc(110) Surface

For a long time, a considerable number of theoretical and experimental studies are fo-cused on film growth. And such films are widely used in modern optical and electric devic-es. STM and AFM are the main devices to study the atom-level process in experiment. At the same time, many theoretical models about thin film growth have been proposed. With development of computer, simulating the growth of thin film can observe some process that can’t observe in experiment; and simulating the growth of thin film can change the parame-ters conveniently, such as temperature and deposition rate.In this paper, we propose a three dimensional model using the kinetic lattice Monte Carlo method. The substrate is300×300tetragonal lattice on Fcc(110), explained the aniso-tropy of the substrate; considering the "downward funneling" in deposition process; in the intralayer diffusion process, considered the anisotropy of adatom’s diffusion and moving around island; in the interlayer process, considered the detailed ascending and descending process, including the anisotropy of the interlayer movement and the second time descend-ing; adopted the planar periodic condition, simulating the thin film growth process on Fcc(110).Using this model, studied effect of the adatom’s ascending and descending probability coverage, substrate temperature, deposition rate on morphology and roughness. The results showed that, with the increase of adatom’s ascending probability,3D island grow higher, the roughness increased quickly and then keep stable, and with the increase of the tempera-ture and the decrease of the deposition rate, the roughness increased gradually; with the in-crease of descending probability, thin film growth will change from island-like growth to laminar growth. When the particle descends along the step edge, the surface roughness of thin film will increase and then decrease rapidly with the decreasing of the deposition rate and the.rising of the substrate temperature, when the coverage increases, the strip island grow, with the increase of the substrate temperature and the decrease of the deposition rate, morphology changed from dispersed to compact, roughness increased.