Introduction Of Two - Dimensional Defects In Anti - Opal - Structured Photonic Crystals And Preparation Of Photonic Crystal Modified Optical Fibers

With the development of information technology, photon drive function material and devices will be widely used in optical storage, optical computing and the field of optical information technology. Obviously, the photonic crystal related to optical communication and information display has very broad application prospects. Introducing a defect in the photonic crystal, defects introduced destroyed the periodic structure of the distribution media, forming a photonic crystal with defects. It is divided into point defects and line defects according to the introduction of different structural defects. Photonic crystal point defect can build high quality factor of resonance cavity with the natural frequency of the point defect eigen frequency, called photonic crystal microcavity. Photonic crystal line defect is known as photonic crystal waveguide. Introduction of the defect structure in the photonic crystal can achieve certain functional devices.The main work of this paper is applying planar lithography and sol-gel co-assembly methods,designed two dimensional defects were engineered in inverse opal films, vertical depositing colloidal crystal composite thin film on silicon substrate by sol-gel co-assembly, the BP212positive photoresist spin coating on composite film uniformly, the mask pattern is replicated on the composite film through lithography process of exposing, developing, etc, vertical depositing a layer of composite film again with the sample, and make pattern covered by composite film. Finally getting rid of the colloidal microspheres and the photoresist pattern, thereby introducing defects in the inverse opal structure. By first lithographic pattern on the wafer, covering the lithography pattern in the deposition of colloidal crystal films. Finally sintering remove photoresist and microspheres, form introducing defects on the surface of the wafer with the protein membrane contact. The sample was characterized with scanning electron microscope. Analysis of the impact of a photoresist pattern on the colloidal microspheres arrangement.In addition, the paper also describes the process parameters with the preparation of anti-protein film structure at the fiber end face, formed a "anti-protein-fiber optic micro structure of the device", the structures have been characterized by scanning electron microscope, and the structure of the test spectrum.