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Surface Laser Direct-write Lithography Research

Posted on:2007-06-23Degree:MasterType:Thesis
Country:ChinaCandidate:W YanFull Text:PDF
GTID:2191360182470801Subject:Measurement technology and equipment
Abstract/Summary:PDF Full Text Request
The study of this dissertation analyses the focus system technology, which is the key technology of curve plane surface lithographic fabrication techniques. Besides that the line width on the curve surface is analyzed.Curve surface need large dynamic focus range. So propose two stage drivers for auto-focus system. Use PZT and stepper to perform the rigid driver and coarse driver and use PID servo to control the system. Basing on this, we promote the pre-search technique, which can auto find the object focus point and adapt to the curve surface variety of highness.In order to get the best focusing method on curve surface, first analyses the off-axis double-quadrant detector, which is good at in de-focus detect on plane. But from the simulation of Zemax, it has no feasibility. Then give two feasible method, eccentricity beam method and double pinhole method. Double pinhole differential method has high accurate precision and can eliminate the disturbance outside, which is the better method in theory.At last do some research on photo-resist coating on curve surface. Build up hydrodynamics model and get the trend of the photo-resist thickness and the relationship of the curvature, coating rotate speed. By experiment we get 8um steady line-width.
Keywords/Search Tags:curve surface lithographic, auto-focus, pre-search, two stage driver
PDF Full Text Request
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