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Investigation Of Patterning Nano-crystalline Diamond Films And Surface Hydrogen Adsorption

Posted on:2010-03-27Degree:MasterType:Thesis
Country:ChinaCandidate:L Z ShiFull Text:PDF
GTID:2190360302461868Subject:Plasma physics
Abstract/Summary:PDF Full Text Request
Diamond has many excellent physics characteristic, such as mechanics,thermology,optics,electricity,and acoustics,chemical stability. It can be used to make high pierceing voltage,forbearing high temperature and high strong radiation excellent characteristic electricity devices. Another hand to be satisfied with nano-diamond semiconductor devices, it is the better effective measure to prepare patterning diamond film by photolithography. Via electron assisted hot filament chemical vapor deposition (EACVD), sulfur as doped atom, and use ultraviolet photolithography, patterning sulfur doped diamond film has been prepeared on the p-type silicon, silicon dioxide as covered film. At the article hydrogen adsorption on diamond (001) surface has been studied by first principles calculation and Materials Studio softwear. Diamond surface(2×1):1H,(2X 1):2H and (2×1):1.5H have been constructed, in the article we analyzed and compared their electron cloud pictures,state density pictures and energy band pictures, steady construction has been gotten by calculating different adsorption energy on hydrogen covered degree. And through this measure different model on electric charge density distributing has been successfully calculated, it is very important that electric charge distributing round surface area to analyze surface eletricity character. And at the basic of the calculating model, analyzing space electric charge distributing round surface area, furthermore, thus can deepen our comprehension to diamond surface electricity character microcosmic reason.
Keywords/Search Tags:diamond film, sulfur doping, chemical vapor deposition, patterning, photolithography, surface adsorption
PDF Full Text Request
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