Ion Beam Is Injected Into The Biological Effects Of Small Molecules

In this article, the development and application of radiation-biologies and bio-effect of low energy ion beam are reviewed at first. The process of ion beam implanted into bio-molecules and the studies of it are also summarized. Second, under different dose rate and energy, many kinds of bio-molecules at different conditions are studied, too.In the chapter 2, the process of N+ and Ar+ with different dose rate implanted into Uracil and Thyim'ne and Uridine with different depths is studied. At low dose rate, several simulative curves were given when the sputtering of the intact sample molecules and the decomposition of the sample were taken into account. The simulative curves are prefect when the coefficients change at different doses. Compared with ions which have low dose rate, ions with high dose rate can damage the sample much more greatly. Although there are "self-restoration" in the implanting process, at the high dose rate, there are more ions implanted into the sample. So there are little chance for self-restoration, it appears that the samples are damaged more greatly at high dose rate than at low dose rate. The study of N+and Ar+ implanted into Uridine with different depths shows that Ar+ can damage the sample more greatly at the beginning. Because the energy loss of Ar+ at each length unit is much greater than N+. But the overall radiation results of both ions are almost the same, for when it comes to the sample with less depth, both can pass through it. And when it comes to the sample with larger depth, though the energy loss of Ar+ at each length unit is much greater than N+, the implantation depth of it is smaller than N+. To N+, it is the another way round.In the chapter 3, by comparison between the different ways of damage of KeV and MeV ions, we found that the curves of KeV ions almost consistent with the target model when the dose is small. But with the dose increasing, the remained sample is much larger than the target model. This is because the implanted ions can not pass through the sample. For MeV ions, because they can pass through the sample, so the curves of dose effect almost consistent with the target model. MeV ions result in highdamage rate, and the relation between remained sample and dose almost consistents with the target model.In the chapter 4, the HPLC analyses of Uridine and Thymidine implanted by ions with high energy are done. The result shows that the dose effect curves of ions with high energy are almost the same to the dose effect curve of ions with low energy. At the beginning, the damage of implanted ions to the sample is large, with the dose increasing, the damage drops sharply. We can also see that the energy is also very important in the process of the implantation, especially when the dose is small.