Low Energy Pt Atoms And Atomic Clusters On Pt (100) Surface The Role Of Molecular Dynamics Simulations

The mechanism of film growth is very important for thin film research. It抯 necessary to study the interaction between atoms and substrate to improve the understanding of film growth. We have studied the influence of the incident atom with low energy on Pt (001) surface by molecular dynamics simulation. Interaction potential with Embedded Atom Method (EAM) was used in the simulation. The incident energy changes from 0.1eV to 200eV, and the substrate temperatures were 100 K,300K and 500 K. The substrate scale is 6x6x4 and 8x8x4 fcc cells for lower and higher incident energy, respectively. The adatom yields, the sputtering yields, the vacancy yields, and the backscattering yields are calculated. The dependence of the adatom yields and sputtering yields on the incident energy and the relative atomistic mechanisms are discussed. We also studied the influence of clusters on Pt(00 1) surface. Pt38, Pt14 and Pt266 are used here. The average incident energy of cluster atoms changes from 0.1eV to 10eV, and the substrate temperature is 300 K. The substrate scale is 12x 12x5, 20x20x5 and 30x30x8 fcc cells for lower and higher incident energy, respectively. The coordinate of mass centre of the cluster, the substrate temperature and the average kinetic energy of cluster atoms are calculated here. And the influence of these three clusters on substrate morphology is discussed.