Study On TiAlN Films Deposited By Multi-method By Multi-arc Ion Plating And Magnetron Sputtering

TiAlN as a new pattern film is wide-spread applied to high-speed cut steel andtitanium and aluminum alloy and other material because it have many advantages, suchas high anti-oxidize temperature, low conduct heat efficiency, high hardness, goodadhesion and small friction coefficient. Now, TiAlN films are deposited by multi-arc ionplating and magnetron sputtering technology mainly. However, it is different forcontrolling Al and Ti proportion of TiAlN films accurately. Many methods adopted suchas alloy target and mosaic target are faced with a series of targetsâ–¡problems. TiAlNfilms is deposited on high speed (W18Cr4V) by multi-method by multi-arc ion platingand magnetron sputtering, realizing the aim to controlling Al and Ti proportion so thatthis method can obtain TiAlN films of different Al/Ti proportions. Discuss surfacemorphology, composition and adhesion of TiAlN films influence law of differentparameters.The results show:1.When the N atom percentage is0and Fe atom percentage is50.65,matrixsurface is not formed films.2. When the Al+Ti/N ratio is more than2.69, the matrix surface is formedmetal or metal compound instead of TiAlN films.3. When the Al+Ti/N during the0and2.69, it can form TiAlN films and theFe contents are less than or equal to10.69, the surface crystalline grains are thickand big. When the Fe contents are more than or equal to25.23, the film surfacecrystalline grains are wee.4.When the Al+Ti/N ratio, Fe contents, Al/Ti ratio are partly equal to0.69,21.75,0.35, it is can form TiAlN films that crystalline grains are thick and big.5. When the Al+Ti/N ratio is equal to1.10, the adhesion is up to47.7N as themaximum.