Controlled Fabrication Of Ordered Arrays Of Nanoparticles Templated By Block Copolymer

Ordered metal and metal oxide nanostructured arrays have attracted increasinginterest due to their potential applications in photocatalytic, photoelectronic, sensors,solar cells, nanogenerator and data storage devices. Hereinto, how to fabricate theseordered arrays with controlled shape, size and position is a challenging problem. Sofar, block copolymer-bsaed lithography has received considerable attention because ofthe advantages to provide ordered arrays of5～50nm length scales with a simple lowcost and scalable process.In this thesis, we study the controlled fabrication of well-defined nanostructuredarrays under different conditions via block copolymer ofpolystyrene-block-poly(2-vinylpyridine)(PS-b-P2VP). Firstly, we investigate theself-assembly of block copolymer on silicon substrate in toluene and THF to obtaindifferent periodicities of arrays of nanoparticles. Three different ways to introducemetallic ions have been explored. By changing the concentration and the type of metalprecursor, we can obtain different sizes and types of arrays of nanoparticles.Furthermore, the effect of the substrate, such as silicon substrate, PDMS stampsreplicated from CD and DVD templates on the resultant arrays has also been studied.Finally we develop a simple technique capitalizing on the multilayered arrangementof cylindrical domains to effectively double the pattern density templated by the blockpolymer. By controlling the solvent annealing condition, the concentration and thetype of metal precursor, we can get different shapes, different sizes, different types ofhigh density of ordered arrays of nanoparticles.