Surface Modification Of PET Film By Pulse Bias Collaborative RF Plasma

As a new electronic technology revolution, flexible electronics have been paid more attention with rapid development in the recent years. Polymer material is the best choice for the flexible substrate because of its transparency, suppleness and mechanical performance. One of the inherently characteristic of polymer is low surface energy. It leads to achieve low adhesion bond between the surface of the flexible substrate and the conductive film. In order to enhance the quality of the bonding can be carried out by surface modification.In this paper, a systematic study of pulse bias collaborative RF plasma and the physical and chemical changes of the treated PET surfaces are analyzed. The evaluation of Field emission scanning electron microscope (FESEM), Atomic force microscope (AFM) and X-ray photoelectron spectroscopy (XPS) are carried out to evaluate the surface morphology and the change of chemical composition. The wettability and adhesion properties were characterized by contact Angle tester and peel tester. On the other hand, the Langmuir probe and emission spectrum are used for the plasma diagnostics. The emission spectrum is analyzed at the luminous intensity of O 777.3 nm (3s5Pâ†'3s5S0),844.6 nm (3p3Pâ†'s5S0) and Ar912.3 nm (2p10â†'1s5).It was found that with a pulse bias collaborative of the RF plasma, the contact angle was reduced up to 20° with the enhanced peeling force of 6 times higher than the untreated film. In the modulation frequency of 1 KHz, the contact angle decreases with the increasing of the bias. The surface roughness of the treated PET film was improved by the plasma etching. On the other hand the amount of the oxygen-containing polar functional groups was elevated on the plasma treated PET film. The comparison of 200 Hz, the surface roughness increases with decreasing of the contact angle. It is due to the low frequency modulation leads to achieve more reactive species which contributes on the etching process. The timeliness analysis in the condition of BV=-800V attributes to achieve an outstanding property. It can be seen by comparison of the samples with and without BV.It has shown that the plasma reactive species has relation to the turning time on the bias voltage. In this study, it is obtained the maximum reactive species with a delay time of 0 ms that has confirmed by AFM testing that shown the highest surface roughness. By delaying time of the bias voltage, the C-C bonds of the uppermost surface leads to be achieved less broken chain by lower energy plasma. On the other hand, the percentage of the aliphatic oxygen was decreased that has contribution on the enhancing of the hydrophilic property.