Realize Of Laser Etching Control System For ITO Films

Along with the development of liquid crystal display (LCD), the requirements of indium tin oxide(ITO) film used for transparent electrodes has increased dramatically. The ITO films have good conductivity, transparent to visible light and strong reflection of infrared light, They were more widly used in LCD TV, solar cells and car windshields.When the ITO films were used as transparent electrodes in liquid crystal display, some electrode line need to be made in the surface of the films, the chemical etching ITO films is the most mature and feasible technology of the preparation of ITO graphics.The laser etching system for ITO films used the characteristics of infrared reflection and absorption of ultraviolet of ITO. It uses UV laser directly on the ITO films attached to the transparent substrate,controls the movement of laser beam by the computer. The ITO films escape from the surface, when they absorp the UV energy.thereby certain electrode pattern were etched out. The laser etching system for ITO films belongs to the cold process, Compared with the chemical etching, it has the irreplaceable advantage.In this paper, after verifying the feasibility of laser etching,the control system of laser etching system for ITO films is designed. It contains optics system, motion control, laser control and PIO control. The laser etching is one integrated system of optical-mechanical-electron, which integrates with optics, precision apparatus, electron technology etc.The innovation of this paper: the beam splitter is designed to turn the Gaussian beam into analogous flat top beam,so the energy of the laser is uniform distribution. We can get the effect of gentle processing. A new optical system is also proposed in my paper, to use the system of after the scanning objectives lens composed of galvanometer and dynamic focusing lens.