Study On The Mechanism Of The Si Plasma Induced By High-Energy Laser

Laser-ablation teehnique has been widely used in many important fields, and its processes of production and expansion are very complex. At the same time,optical emission spectral measurement is a suitable and convenient method for the diagnosis and analysis of hight-energy laser induce plasma. In this thesis,we studied the emission spectra of laser irradiation Si plasma.In monocrystalline silicon electro-optical nature foundation,we select Nd: YAG solid state laser as pumping laser and silicon is sample. Through modulating the energy of laser we obtain spectra from 380nm-1200nm of silicon sample.Within 5mm of near the Si target, there were the continuum spectra and the line emissions,the former was produced by Bremsstrahlung and compound of electrons,the later came from the excited state of Si,and Si~+. Based on this and analyzes the damage mechanism of heat and mechanical studies in Si target induced by laser.