Study On Processes For High Speed Growth Of Diamond Thin Film

Diamond material arouses people's abroad attention for its remarkable properties. In recent years , all kinds of methods prepared diamond film are developed. With the deeply investigation of synthesizing technique by low pressure CVD, the quality of diamond film is improved greatly. However, low growth rate interferes the application of diamond film.In this paper, the high speed growth of diamond film is discussed. After investigation of DC plasma jet CVD technique, we design the DC plasma jet array. Based on it, DC plasma jet CVD technique is combined with Hot filament CVD technique. The advantages of two techniques are utilized by this innovative composite method.The high speed growth process of diamond film is studied in the condition of DC plasma jet assisted-HFCVD. The influence of DC assistant voltage on growth rate and nucleation density is described. Meanwhile, the effect of the key process parameters such as the CH4 concentration, the substrate temperature, the gas pressure on growth rate is investigated. The optimum process of high speed growth is obtained. The experimental results show that the growth rate of diamond film is improved greatly by this new method of DC plasma jet assisted-HFCVD compared with the traditional HFCVD.