Study On Design Of Probe Microelectrode Array For Optic Nerve Stimulation

As the development of Neural Engineering,implantable neural microelectrode has been a new exciting field in neural science and microelectronics.Microelectrode,as the key part of Brain--Machine Interface and the connection between neural signals and electrical signals,has been more and more concentrated on.There are four major kinds of microelectrodes:planar electrode,cuff electrode,sieve electrode and probe electrode. Probe microelectrode has its own advantages,comparing to other forms of microelectrode. It is wildly employed in Deep-Brain stimulation because of Its high density and easy to integrated.Several probe microelectrode fabrication processes,however popular,are complex and time-consuming.These disadvantages hinder the further development of probe microelectrode.As a result,a feasible,or even convenient fabrication process should be developed.In this dissertation,after systematic analyzing several world widely accepted fabrication processes of probe microelectrodes,we design a easy way to fabricated this tungsten based probe microelectrode.Its properties are measured in physical,electrical and biological ways as well.The topics of this dissertation are presented as below:1.Investigate and analyze the fabrication processes of probe microelectrode.Design a low-cost way to fabricate the tungsten based probe microelectrode;2.Refine the fabrication process according to the feed back experimental data; 3.Solve the difficulties of tungsten insulation process and compare the tip process in different conditions;4.Probe microelectrode measurement of electrical properties,cytotoxicity and invivo experiment.According to the results,this tungsten based probe microelectrode,designed by our low-cost fabrication process,has fine properties and adaptable for long term implanting.