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The Preparation And Properties Of Ga2O3: Mn Electroluminescent Thin Films

Posted on:2006-03-28Degree:MasterType:Thesis
Country:ChinaCandidate:X T ZhangFull Text:PDF
GTID:2178360212982542Subject:Microelectronics and Solid State Electronics
Abstract/Summary:PDF Full Text Request
With the developments of electronic information, military, aeronautic and aerospace technology, the more demands for the display which is the man-machine interface are need. Display technology will develop great in such aspects as full color, high luminescence, high contrast, flatting, low energy consumption, heath and environment protecting. AC(alternating current) inorganic thin-film electroluminescent (TFEL) display device, which has many merits such as full solid, active light-emissive, wide viewing, rapid responding and great environment adaptability, has been gaining much attention. Especially, AC oxide-based thin-film electroluminescent device, with great thermo-chemical stability, long life-span, good display performance, will gain great applications.In this dissertation, the deposition and heat-treatment technique of Ga2O3:Mn phosphor thin film used for TFEL device and its luminescent property have been studied. The phosphor thin film of Ga2O3:Mn was deposited by electron beam evaporation. By refractive index measuring and microstructure analysis such as surface morphology and crystal structure, the relations between the microstructure and luminescent property of Ga2O3:Mn thin film and the deposition and heat-treatment of Ga2O3:Mn thin film were studied, the art of deposition and heat-treatment optimized, the moderate parameter of the deposition and heat-treatment of Ga2O3:Mn thin film determined. Ga2O3:Mn thin film electroluminescent devices taking BaTiO3 ceramic as substrate, which has better luminescent property, were made.Research results show that heat-treatment temperature has important effect on crystal structure and orientation of the Ga2O3:Mn thin film. with the heat-treatment temperature increasing, the crystallization of Ga2O3:Mn thin film increase gradually, and its crystal structure charges from non-crystalline to polycrystalline, from mixed crystal structure composed of monoclinic, hexagonal and cubic crystal systems when the heat-treatment temperature is low to monoclinic structure, gradually. The color of the light emitting from Ga2O3:Mn TFEL device is green. The main peaks of the emitting spectrum lie mainly between 490nm and 535nm. With the increasing of driving voltages, the blue shift of spectral peaks is observed. The luminescence property of Ga2O3:Mn TFEL device, is not only related to the crystallization of Ga2O3:Mn thin film phosphor, but also depend mainly on its crystal structure and orientation.
Keywords/Search Tags:Ga2O3:Mn, thin film electroluminescent, electron beam evaporation, crystal structure, surface morphology
PDF Full Text Request
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