Deposition Of Ti/BDD To Produce Electrodes For Electrochemical Applications

Diamond-based materials are of great interest due to their extreme and beneficial properties, such as mechanical hardness,chemical inertness, low electrical conductivity for undoped annealed diamond, high electrical conductivity when doped, e.g., with boron, IR-transparency, and high thermal conductivity.1 The advent of novel chemical vapor deposition CVD techniques allowed new types of synthetic diamond films to be grown and modified by doping with boron, nitrogen, metals, or metal clusters. This availability of new materials with interesting properties opensup opportunities for applications, e.g., in electrochemistry.In this paper ,Boron doped diamond film deposited on Ti sheets by the hot-filament method, using B2O3 as a boron source to produce electrodes for electrochemical applications, was studied. Diamond growth on metallic titanium is proceeded by the formation of an intermediate TiC layer, which ensures a good electrical connection between the Ti substrate and the diamond but leads to poor adhesion of the layers. The Ti/BDD obtained was investigated with XRD and Metallurgical Microscopy. To examine the electrochemical properties of diamond layers, cyclic voltammetry measurements were carried out in 1 M H2SO4.