The Research Of Nanoimprint And Anti-Adhesive Film

Moore's Law tells us that the number of transistors on a microprocessor would double approximately every 18 months. But with the development of technology, the cost of lithography equipment increases. Nanoimprint is a promising Next Generation Lighography(NGL) technology. And now it is gradually applied on different areas of microfabrication for its advantages such as low cost, good reduplication, easy to control.In this thesis, we review the background and the related research of nanoimprint at home and abroad, and then we begin the research in application of nanoimprint. This thesis introduces the technology process of hot-pressed nanoimprint firstly, and then tries to reduplicate the specific device by nanoimprint technology. The device we decide to reduplicate is micro-structured grating. The period of the grating pattern is 1.67μand the line width is 830nm. The micro-structured grating would applied on the dense wavelength division multiplexing (DWDM) at the wavelength of 1550nm. The stamp of grating is fabricated by holographic diffraction and inductive coupled plasma (ICP) technology. Then we get the imprinted pattern by hot-pressed technology and use polyethylene terephthalate glycol (PETG) as the imprinted material. In this experiment, we optimize the parameters in the imprint process and analyze the disadvantages of this technology.Because the imprint process is used on micro-structure, the friction force and the removing of stamp is a key problem for the quality of imprinted pattern. For a better imprint result, we fabricate the anti-adhesive film on the surface of stamp by 1H,1H,2H, 2H-perfluorodecyltrichlorosilane and RIE reaction. We still test the average roughness, contact angle, surface energy and appearance of the surface. They all prove that these two kinds of anti-adhesive film are effective in the process of nanoimprint and can help us...