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Method And Simulation Of Micro Optical Elements Fabricated By Digital Lithography Technology

Posted on:2007-09-05Degree:MasterType:Thesis
Country:ChinaCandidate:Q DuanFull Text:PDF
GTID:2178360185493672Subject:Optics
Abstract/Summary:PDF Full Text Request
In recent years, Micro-Machine System (MEMS) and Micro-optical-Machine System (MOEMS) technology based on micro-optics, microelectronic and micro-mechanical device rapidly develop, which drive the increasing improvement of micro-machining technique. It shows wide application prospect in a good many high-tech field of aerospace, optical fiber communication, optical interconnect, optical calculation and so on. It produces profound influence to the whole information age, and brings ultimate change of traditional optics, traditional industry and people living.Micro-optics has acquired quite great progress in design theory and manufacturing method. For further extending application field of micro-optics, the manufacturing method of micro-optics is advised more new requests. Therefore, studying convenient and effective manufacturing new method of micro-optics is a important direction of domestic and overseas micro-optics field now. This paper presents new method of DM'D real-time gray lithography of quickly, parallelly, neatly fabricate micro-optics, and profoundly discusses the imaging theory of digital lithography technology, quick and optimizing algorithm of digital image, and data transfer and so on. We build a fire-new, applied partially coherent model describing digital gray lithography process, and present serial digital image designing method of properly modulating scanning-velocity, row space, digital image numbers, gray configuration and image alignment space based on the model and the thought of wavefront project of optimizing substract exposure dose distribution. It supplies basis for micro-optical element fabrication and deeply development of digital lithography technology.Through the development of this technique, the conventional photolithography is greatly simplified as a single DMD digital mask can replace a set of conventional masks. Alignment between different levels of masks in conventional photolithography is no longer necessary if the DMD digital mask is used. Because the mask design can be adjusted in real time, it is comparatively easy to change the...
Keywords/Search Tags:digital lithography technology, real-time mask, DMD, optimizing design, micro-optical elements
PDF Full Text Request
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