Reasearch On The Maskless Lithography System

In this paper, a maskless lithography system is proposed. It provides a new method to nanofabrication and it is the trend for next generation lithography technology. Based on this system, there is no need to use masks in lithography processes to generate and process patterns because the current emitted from micro tip can directly exposure the photoresist. The working efficiency is greatly enhanced through array parallel writing.The main research achievements are listed as follows:1. The micro-tip array which is the key element of the maskless lithography system is designed and fabricated and the standard processings for the micro-fabrication are developed. The field electron emission through the micro-tip array is verified.2. The vacuum system for maskless lithography is set up completely. The transformation from CIF to binary coding which can be recognized by the micropositioner is accomplished.3. The efficiency of electron emission of microtip array is tested and good experimental results are received.