X-ray Kinematics And Its Application In Epitaxial Semiconductor Materials

X-ray Kinematics, characterized by its clear physical conception, is widely used in modern semiconductor material analysis. Whereas its analysis appliance is restricted within the totally periodic structures such as super-lattice and quantum pots. Bearing the intension of applying the theory to common structured materials by introducing several amend, we have done the following works:1. We have addressed the essential physical meaning of kinematics and offered derivation of its kernel parts. And we have also expatiated the limitations in applying the kinematics to material analysis.2. Based on the kinematics, we have analyzed in detail the problems such as substrate diffraction, thin layer effect and instrument effect in applying the kinematics in material analysis and provided corresponding solve.3. We have analyzed the single layer material, quantum well material and material comprise of superlattice by using kinematics and dynamics in a comparative way. The result validated the amends we have introduced.4. We have pointed out the privilege in utilize of kinematics in the analysis. Also we have addressed the remaining problems and their alternative solve.The experimental results revealed that except for a much-complicated material structure in which the kinematical theory's sensitivity to structural parameters become comparatively lower than the dynamical theory, applying kinematical theory to a common structure material by introducing the prior amend can draw to a fairly consistent conclusion with the experimental results. Besides, the clear physical meaning of kinematical is critical aid in explain the simulation results and in later parameters adjustment in material growth.