| Thin films optical waveguide is one of important devices in the systems of optical communication and optical information processing.The study and development of it are one aspect in the information science field,which can meet the needs of a high speed rate,much information transmission,storage,interchange and processing.Optical thin films can be applied widely in the system of optical fiber communication.There are various approaches of fabricating thin films optical waveguide and optical thin films.But the ionic self-assembly deposition technique developed in the late 1980's is a new technique used to fabricate thin films with its main advantages:easy control,easy fabrication of films,controllable film thickness and low cost.This technology has been paid much attention to.At present the related reports haven't been read yet about how to employ the ionic self-assembly deposition technique to fabricate thin films optical waveguide.Moreover,few reports have appeared about to fabricate optical thin films by it.This paper aims at finding out how to fabricate thin films optical waveguide and optical thin films by using this technology so as to lay a foundation for a further study.The main contents in the paper are as follows: 1. thin films optical waveguide and optical thin films are of importance to optical communication,optical calculation and optical sense.The paper illustrates routine fabricating methods of thin films optical waveguide,pointing out their disadvantages as well as a new technology used to fabricate thin films optical waveguide and optical thin films - ionic self-assembly deposition technique. 2.The paper studies the principle of film fabrication,characteristic and application of this technology.In additional discusses on the influencing factors. 3.TiO2 colloid is synthetized by the main raw material of tetra-n-butyle titanate.The paper has studied the influence of the value of pH on the stability of the TiO2 colloid. Tetra-n-butyle titanate is put into SiO2 colloid to synthetize the mixed colloid of SiOa and TiOa. 4.This technology is used to fabricate respectively PDDA/SiO2 and PSS/TiO2 optical thin films.The film structure and optical property are studied by using UV-vis spectroscopy,X-ray diffraction spectroscopy,X-ray photoelectron spectroscopy and fiber optic experimental setups.The reflection-enhancing mechanism is studied of multilayer thin films.Andoptical reflection-enhancing thin films are assembld. 5.The basic concept of thin films optical waveguide and maths models are made and calculation formula is put forward. 113 double-leveled optical waveguide is assembled.The optical constants of films are measured by means of Manifacier,spectrophotometry and prism coupling method. 6.Both the measuring principle of the waveguide attenuation and influencing factors of single- mode transmission are studied.The calculation formula of the waveguide attenuation is given.We have come to the following main conclusions by fabricating optical thin films and waveguide and testing their properties: l.SiOi with the function of tranmission-enhancing can be used to fabricate transmission-enhancing films.The refractive index and the geometry thickness of every double levels are respectively 1.39 and 7 nm(suggesting the concentration of SiOi colloid is 10mg/ml).The film thickness and double leveled numbers form a linear optical relation,suggesting that every double levels contribute the same materials in number to thin films. 2.Ti02/PSS composite thin films having the function of reflection-enhaning can be used to fabricate reflection-enhancing films.The refractive index and the geometry thickness of every double levels are respectively 1.81 and 4.6 nm. 3.The test and analysis show that it is the best to choose the mixed colloid composed of 30% TiOi and 70% SiO2 to fabricate thin films optical waveguide when the wave length is 632.8 nm.113 double-leveled waveguide can transmit single mode. The refractive index and film thickness of wveguide are respectively 1.58 and 1139 nm or so.
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