| Based on the design theory of soft X-ray optical multilayer thin films and magneto-optic multilayer thin films, the metal multilayer thin films for the reflection of soft X-ray and ultraviolet ray, as well as the magneto-optic multilayer thin films for the magneto-optical memories were constructed. The metal multilayer thin films and the magneto-optic multilayer thin films were deposited with magnetron sputtering. The detail of optical reflection characteristics, layered-structure, surface and interface characteristics were studied. At the same time, the static magneto-optical characteristics and dynamic magneto-optical characteristics of the magneto-optical disk were investigated.In view of multilayer structure of the Ti/Cu, Nb/Cu and Mo/Si thin films, the studies were focused on the relationship between the sputtering power and rates. As the result of such studies, the function of sputtering power and sputtering rates was established and then the accuracy of constructions of the thin films layer period wavelength and thickness was improved. The Ti/Cu, Nb/Cu and Mo/Si multilayer thin films with the wavelength of 86.7?, 87.2? and 74?, the periods of 15, 20, 25, 30 and 35 were deposited, respectively.The small X-ray scatter was first time used to analyze surface and interface characteristics of Ti/Cu and Nb/Cu multilayer thin films. The reflectivity of soft X-ray and ultraviolet ray multilayer thin films was highly sensitive to the roughness of surface and interface. The increasing of the interface roughness will result in the rapid decreasing of the reflectivity; the increasing of the layer periods brings about the accumulation of the interface roughness layer-by-layer, and then the general roughness was enlarged; the increasing of the substrate temperature results in the enhanced diffusion of layer-to-layer and the intermediate compound was formed, thus the smoothness and the sharpness of the interface was reduced and the roughness of the interface was increased; the relationship between the roughness and the thin films deposition process was also established.The metal multilayer thin films with sharp interface and superlattice structure were successfully deposited with the optimization of the substrate temperature and the ambient gas. For the Ti/Cu multilayer thin films, the reflectivity of normal incidence soft X-ray at the wavelength of 42.7? reached to 1.8%, and to 23.5% for the Mo/Si multilayer thin film. The reflectivity of ultraviolet ray at 200nm wavelength for the Ti/Cu multilayer thin film reached to 90%.It was the first time that the arrangement of magnet for magneto-optical target cathode was changed from circle to bone shape. So the magnetic field distribution along the target surface became more symmetrical, and the uniformity of the thin film was improved. The composition and the uniformity of magneto-optical thin film could be adjusted through the sputtering power and argon. The optimize sputtering parameters were as below: Ar flux of 60-80sccm, and the sputter power of 500-800W. The thickness uniformity of the magneto-optical thin film was up to ±1.5%, and the ingredient homogeneous was ±2% on the φ86mm substrate.The magneto-optical performance directly depended on the uniformity of the magneto-optical multilayer thin films. Based on the study of the relationship between Ar/N2 and optical performance of SiN film, the optimal optical refractive index of the SiN film was ascertained as 2.03. The optimize condition were as followings: the Ar/N2 ratio of 80sccm/40sccm, and the sputter power of 2000W. Therefore, the thickness uniformity of the SiN film was up to ±2%, and the uniformity of the optical refractive index for ±2.0% was obtained on the same size substrate.Based on the study of the magneto-optical static and dynamic performance multilayer magneto-optical film structure was put forward. The first practicality magneto-optical disk had been prepared at home. Its capability reached the ISO standard and it had the capability of credible information read-write and informati...
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