In the recent years, amorphous silicon solar cells deposited on polymeric film substrate were getting more attention. Polymeric substrates, being light, large area series connected, flexible and non-breaking, offer additional unique advantages. Furthermore the cells on polyimide can be fabricated by roll-to-roll processing and the high price of solar cells can be decreased. So the solar cells deposited on polymeric film substrate have a promising prospects.In this paper, we investigated the properties of thin film material deposited on polyimide. The thin film material was prepared in a multi-chamber PECVD deposition system. This system had been modified according to plastic substrate requirements.The specific work can be summed up as following: l)The selection and treatment of polymeric substrate.2) For obtaining the best performance of intrinsic a~Si :H deposited on polyimide, we investigated the influence of substrate temperature powers pressure and flow.3) The high quality of p-type window layer on polyimide was gained by boron doping a-Si,-xCx:H.4) When the deposition feed gas for n-type layer was 0.6% silane(Si:H4) in hydrogen(H2), we can deposit the ideal n-type c-Si :H on polyimide.
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