Studies On The Double-layered Anti-reflective Coatings For Monocrystalline Silicon Solar Cells

ABSTRACT:Based on the ultra-wide band anti-reflection characteristics of double-layer silicon nitride films in 400～1000 nm wavelength range, the traditional silicon nitride anti-reflective film was improved. Though the simulation of software PC1D, the impact of the silicon nitride antireflective coating thickness and refractive index change on the electrical properties of single crystal silicon solar cell was investigated. Combined with the best refractive index and thickness of the bilayer silicon nitride film acquired during the experiment, bilayer silicon nitride film solar cells and single-layer silicon nitride film solar cells were prepared.The reflectivity, quantum efficiency, minority carrier lifetime and electrical performance parameters of monocrystalline silicon solar cells were measured. Results proved the improved silicon nitride antireflective coating better anti-reflection and passivation than the traditional single-layer film.For the solar cells with bilayer structure, the average reflectances decreased, and open circuit voltage short-circuit current and conversion efficiency incease 9mV,0.27A and 0.3%, separately. Thus, double silicon nitride film not only has excellent characteristics of ultra-wideband antireflection and passivation, but also can effectively improve the photoelectric conversion efficiency of industrial solar cells.