| In this thesis, the structure, properties, applications and development of silicon films have been summarized. The basic principle, features and applications of Chemical Vapor Deposition (CVD) have been represented in detail and the saving energy features of coated glass have been refered to.Silicon films have been prepared with silane (SiH4) as the source gas by atmosphere pressure chemical vapor deposition (APCVD) on moving glass substrates under the conditions simulating technical process on float glass production line. The microstructure of films and its influence on the mechanical and optical properties have been systematically studied by means of the measurements of Transmission Electron Microscope (TEM), Scanning Electron Microscope (SEM), Raman scattering spectrum and Fourier Transformed Infrared spectrum. It can be observed that nanometric ordered domains embed in the silicon matrix as demonstrated by TEM, and the size of crystalline silicon particles will increase with increasing of deposition temperature from 600℃ to 680℃. The silicon and silicon carbide composition films were prepared with ethylene (C2H4) doped. The experimental results show that the deposition rate of films is gradually decreased with the increasing of C2H4/SiH4 mole ratio, and the disorder degree of composition films will decrease. As a result, the distribution of particles can be improved. It is estimated that some kinds of Si-C bond exists in it, and the silicon oxidation reaction can be promoted by doped carbon.The effects of deposition process on mechanical and optical properties of films were investigated. The adhesion of film to glass substrate increases with the rise in temperature and decreased in some sort with the raising doped ethylene ratio. As can be seen, the films show high transmission of visible and near infrared, but low transmission of UV wavelengths. With the increasing of deposition temperature, the average transmittance will decrease, but the average reflectance will increase.
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