The Performance And The Application Of The Metal Nitride Thin Film By Multi-arcs Ion Plating

The deposition principle and development of multi-arc ion plating technology are introduced in this paper. The industrial application of this deposition technology is also described.The structure of this ion plating equipment is recited. The effects of some parameters on the films are studied using Cr,Ti and TiAl as the target. Cr-N and TiAlN films are deposited in this equipment, the influences of deposition parameters on the structure and properties of the films are analyzed, such as the ratio of gas (N₂ and Ar), arc current, and bias voltage.The results show that the hardness and the wear resistance property of the films and that substrates are improved by depositing Cr-N films. XRD analyses indicate that with the increasing of the ratio of N₂, the structures of the Cr-N films are changed from Cr to Cr₂N, then Cr₂N+ CrN, finally CrN., it is possible to be related to the N₂ ratio of the mixing gas._But said regarding TiAlN, in deposition thin film mainly is composing of TiAlN and Ti₂AlN primarily, also includes A1N and TiN, along with the N₂ flow capacity increase, its microhardness and the binding energy all changes slightly._Al to the influence of thin film hardness is because the Al atom joined changes the thin film structure to create.In the experiment, bias voltage has little effect on the hardness of Cr-N films, while arc current is the main parameter to control the hardness of Cr-N films. The higher the arc current is. the lower the hardness is. It is because that the main structures of the films change from Cr to CrN when arc current decrease.