| Lithography and it's development has been one of focus in electronics industry. Extreme ultraviolet lithography (EUVL) is the best candidate for the next generation lithography. However, many technique bottlenecks are needed to overcome before commercialization.Lithography is the most important technic when manufacturing of Large Scale Integrate Circuit. The lithography lens is the core of the lithography, whose capability determines the transfer capability of the pattern directly. The design principle and integration of basic optics system are introduced in this paper. Several advanced EUVL projection cameras are discussed here, and a new design of off-axis five mirrors optics is presented based on the six mirrors optics. The new one is very suit for the commercialization at optical quality and free work distance. In order to accomplish this aim, the final aspherical mirror processing and Computer-assistant optical adjustment are also discussed.Moreover, based on the lithography lenses which can be used to basic optics system by one step, we analyzed the various factors which may cause the image quality deterioration of the optical system especially for this type of lenses in this paper, by ZEMAX simulation we get the result of the lens design. |
