| The research presented herein is based on experimental work which has been conducted for the purpose of developing intense extreme-ultraviolet (EUV) capillary-discharge-driven plasma sources which are compatible with Mo:Si multilayer-coated mirrors, operating in the 13--14-nm wavelength region. Although such sources may have a variety of applications, the discussions through this text relate, particularly, to that of extreme-ultraviolet lithography, which is one of the most demanding applications for which an EUV source might be used.;Two capillary discharge sources have been investigated---one operates in a lithium metal vapor, whereas the other operates in a xenon gas. Both source generate intense EUV emission within the 13--14-nm wavelength region. The experimental results which have been obtained indicate that both sources may be suitable for EUVL or other EUV imaging applications. |
