Simulation Of Light Scattering Of A Sphere On A Plane Surface Based On Extension Of Mie Theory

Clean-room monitoring and quality control of silicon wafers are very important and difficult in the field of the Integrated Yield Management (IYM). It is a very efficient way to inspect materials for surface quality by the method of light scattering. In practice both hardware and software are used to solve the questions. The development of more sensitive and accurate light-scattering tools requires the understanding of the scattering behavior of the different types of defect that the tools are expected to encounter. Theoretical models, validated by well-characterized measurements, enable manufacturers to predict and optimize the performance of their tools. In this paper the question of light scattering of a sphere on a plane surface is solved based on the extension of Mie theory. Calculating the scattering is complicated because the boundary conditions at the sphere and the plane surface must satisfied simultaneously. The total scattered field can be found as the superposition of the field scattered by the sphere, the field reflects off the plane interface and the interacting field between the sphere and plane. The figures of the differential scattering cross section (DSCS) of both a sphere and a coated sphere over a plane surface are calculated and discussed in detail. Light scattering character of spherical particle on silicon surface can be obtained through solving the system model with mathematics and computer tools.Considering the application in engineering, a friendly software interface is also made so that one can get the scattering figure easily. This paper presents a strong academic method for the monitoring equipment.