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Research On 900nm~1100nm Anti-laser-induced Damage High Reflectance Film

Posted on:2011-03-01Degree:MasterType:Thesis
Country:ChinaCandidate:Y W ZhaoFull Text:PDF
GTID:2120330332956388Subject:Optical Engineering
Abstract/Summary:PDF Full Text Request
In order to meet the special applications of optical instrument that could use both semiconductor laser and YAG laser as light source. We deposit high laser-induced damage threshold reflectance film on 10*1.8mm K9 basement.Base on the theory of interference and the use of technical requirements to choose coating materials, use TFC software to design the coating structure. Adopting electron beam vacuum coating and Kaufman ion source assisted technique, through analyzing the test result of coated substrate, adjusting parameters of coating process and method of monitor, the error of thickness is reduced. Choosing TiO2 and SiO2 as high and low refraction materials, the problems of thin-film optical loss and anti-laser-induced damage are solved.Prepared anti-laser high-reflective thin-film, when the laser incidence is 45°, reflectivity of p-component and s-component at the wavelength between 900nm-1100nm is more than 99.95%. The coating pass the environmental testing, it can work on the harsh space environment and resist the laser irradiation. The film satisfies the using requirements.
Keywords/Search Tags:optical thin-film, high reflectance film, laser-induced damage, depolarization
PDF Full Text Request
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