Study On The Manufacturing Method Of Optical Film Microstructure

Self-organization nanostructure has many potential applications in nanotechnology research. Low energy ion beam etching technology is considered as an effective method to form self-organized nanostructures. In this paper, the influence of the factors of ion beam sputtering and surface diffusion on the film surface microstructure was studied in detail.Silver films were deposited by ion beam assisted evaporation in order to study the influences of the main experiment parameters such as ion energy, ion beam current and deposition temperatures.The thickness of film is about 280nm.The deposition experiments was carried out into three groups:(1) ion beam assisted in the whole deposition process; (2) continue to deposit 50nm silver film after ion beam assisted deposition of 230nm silver film; (3) continue ion beam etching after 280nm silver film deposition. The film surface morphology, surface roughness, optical constants and reflectivity were measured, the results showed that:1) When the deposition temperature was 32℃,65℃,125℃or 200℃, the silver film surface roughness initially decrease and then increase with increasing ion beam energy in the ion beam assisted deposition process. The minimum roughness is obtained at 1200eV. The obvious change in surface microstructure can be found at 1300 eV when the deposition temperature was 65℃or 125℃. If the deposition temperature was 32℃, the silver film surface roughness decrease with increasing ion-beam energy in the experiment which continue to deposit silver film after ion beam assisted deposition.2) When the deposition temperature was 32℃, the silver film surface roughness increase with increasing ion beam current which from 6.5mA to 15mA in the ion beam assisted deposition process.If the deposition temperature was 65℃,125℃or 200℃, the silver film surface roughness decrease with increasing ion beam current. The obvious change in surface microstructure can be found at 15mA when the deposition temperature was 65℃or 125℃. If the deposition temperature was 32℃, the silver film surface roughness decrease with increasing ion beam current from 6.5mA to15mA in the experiment which continue to deposit silver film after ion beam assisted deposition. But if the ion beam current continue to increase to 18mA, the silver film surface roughness increase again.3) The silver film surface roughness decrease with increasing deposition temperature from 32℃to 200℃in the ion beam assisted deposition process. The silver film surface roughness decrease with increasing deposition temperature from 32℃to 125℃in the experiment which continue to deposit silver film after ion beam assisted deposition. But if the deposition temperature continued to rise to 200℃, the silver film surface roughness increase again. The silver film surface roughness increase with increasing deposition temperature from 32℃to 200℃in the experiment which continue ion beam etching after silver film deposition.4) The grains of silver film surface become more closely either in low or high temperature conditions in the experiment which continue to deposit silver film after ion beam assisted deposition.5) When the deposition temperature was 32℃or 125℃, the obvious change in surface microstructure can be found in the experiment which continue ion beam etching after silver film deposition. The grains of silver film surface become smaller and arranged orderly. If the deposition temperature was 200℃, the grains of silver film surface become irregular and arranged disorderly.