New organic materials for microelectronics applications

Semiconductor device advances are directly related to the continuing decrease in feature size. To keep pace with these advances the Multichip Modules approach was developed. The performance advantages seen from this technology come in part from the thin film polymer dielectric that is used in their fabrication. Among the available polymers, benzocyclobutenes offer some distinct advantages. However, adhesion promoters are still typically required because the metal-polymer interfacial strength is low and delamination can occur particularly with copper. The increasing complexity of these advances has also prompted the need for developing imaging systems with improved sensitivity and resolution. The research reported here is focused on these issues.; In an ongoing effort to better understand the factors governing a good adhesion promoter system, a series of compounds possessing substituents reactive with the dielectric and capable of chelating with the metal were synthesized. These, and a select number of commercially available compounds, were evaluated for use as adhesion promoters in a low pH environment. Electroless copper metallization was achieved. It has been demonstrated that solution pH, concentration of promoter, and application of promoter are variables which must be considered for the successful development of an adhesion promoter system.; Enol ethers and acetals possessing a reactive double bond were investigated as pendant blocking groups in poly(4-hydroxystyrenes). Enol ether and acetal protected poly(4-hydroxystyrenes) were prepared by free radical polymerization of the monomers. Thermal treatment of the polymer results in a Claisen rearrangement to produce alkylated phenolic moieties. Treatment of the polymer with acid releases the masked acetonyl group in the case of the enol ether, and acid catalyzed cleaves the acetal, resulting in a large change in polarity of the polymer. The original polymers are soluble in organic solvents whereas the unmasked polymers are soluble in aqueous base. This, in principle, provides a method of chemical amplification. The acetal protected resist system exhibited 0.20 {dollar}mu{dollar}m line/space resolution without requiring post-exposure bake. The enol ether-protected system demonstrated a high sensitivity however, the quality of the image was not completely satisfactory.