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Fast kinetic modelling of low-pressure inductively-coupled discharges

Posted on:2006-04-15Degree:Ph.DType:Dissertation
University:The University of ToledoCandidate:Polomarov, OlegFull Text:PDF
GTID:1450390005993311Subject:Physics
Abstract/Summary:
In low-pressure discharges, when the electron mean free path is larger or comparable to the discharge length, the electron dynamics is essentially nonlocal. Moreover, the electron energy distribution function (EEDF) deviates considerably from a Maxwellian. Therefore, an accurate kinetic description of the low-pressure discharges requires knowledge of the nonlocal conductivity operator and calculation of the non-Maxwellian EEDF. Previous treatments made use of simplifying assumptions: a uniform density profile and a Maxwellian EEDF. In the present study a self-consistent system of equations for the kinetic description of nonlocal, nonuniform, nearly collisionless plasmas of low-pressure discharges is derived. It consists of the nonlocal conductivity operator and the averaged kinetic equation for calculation of the non-Maxwellian EEDF.; The importance of accounting for a non-uniform density profile for modelling of collisionless electron heating in a bounded low-pressure plasma is demonstrated. A drastic enhancement of the power transfer into an inductive plasma under the condition of a bounce resonance is observed if the non-uniformity of the plasma density profile is accounted for. This enhanced plasma heating is attributed to the increase of the number of resonant electrons, for which the bounce frequency of electrons confined inside the plasma potential is equal to the rf field frequency.; The influence of a weak constant external magnetic field on the properties of low-pressure, low-temperature inductively-coupled plasmas is shown through a self-consistent, one-dimensional, fast modelling of planar magnetically enhanced inductively-coupled discharges, driven by a radio frequency electromagnetic field. Introducing of an external magnetic field leads to considerable increase of plasma resistivity, due to possible electron-cyclotron and transmission resonances. The related changes of the discharge parameters, such as electron temperature and plasma density are considered. The effects of self-consistency and importance of explicit accounting of non-uniformity of a plasma density profile are demonstrated. The non-uniform plasma density profile, or an ambipolar electrostatic potential can lead to drastic change of the power deposition through the collisionless heating, comparing to the case of an uniform plasma.
Keywords/Search Tags:Low-pressure, Discharges, Plasma, Kinetic, Density profile, Electron, Modelling, Inductively-coupled
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